Gate Deposition Mask, High Density Design Type:Gate Deposition Mask - Interdigitated Channel HD OFETs 600 cd/m2 Max

600 cd/m2 Max

High Density Gate Deposition Mask

m – 10 kΩ

Plus improved aerodynamics and mechanical performance produce more uniform films

m to 500 mΩ

Gate Deposition Mask, High Density Design Type:Gate Deposition Mask - Interdigitated Channel HD OFETs 600 cd/m2 MaxHigh Density Gate Deposition Mask Enabling accurate deposition resolution An evaporation mask for deposition of gate contacts, for use with the high density OFET system. A 100 m standoff spacer ensures that the mask does not touch the substrate while still enabling good deposition resolution. Mask with direct contact (no spacer): For sputtering and other non directional deposition systems, as well as for thermal deposition systems with oblique angles