PELCO® 35nm Silicon Nitride Support Films for TEM Rotated b) High density polyethylene (HDPE

b) High density polyethylene (HDPE

5 Front Angle: 25 ± 5 Back Angle: 15 ± 5 Side Angle: 22

the next level in a series of magnification calibration standards (the MRS-1

Celcon® (POM) - Excellent wear resistance and resistance to most solvents and fuels - maximum temperature is 175°F (80°C)

This kit is used to mount most commercially available afm probes onto pre-aligned substrates for easy installation and alignment in the afm+ and nanoIR systems

PELCO® 35nm Silicon Nitride Support Films for TEM Rotated b) High density polyethylene (HDPEDESCRIPTION PRODUCT SPECIFICATIONS 35nm membrane thickness 25 apertures 200m frame thickness 21515 10 Silicon Nitride Support Film, 35nm, 70x70m Aperture (25) on 0. 5 x 0. 5mm Window pkg 10 Defining parameters for the PELCO Silicon Nitride Support Films are: Film Thickness: Resilient, ultra low stress 8, 15, 35 or 50nm giving rise to minimum absorption to enable clear imaging; robust, low stress 200nm for better handling and use on multiple platforms;